A Process-Scalable RF Transmitter Using 90nm and 65nm Si CMOS

Publication Information

Title

Japanese:
English:	A Process-Scalable RF Transmitter Using 90nm and 65nm Si CMOS

Author

Japanese:	白根篤史, 伊藤浩之, 石原昇, 益一哉.
English:	Atsushi Shirane, Hiroyuki Ito, Noboru Ishihara, Kazuya Masu.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

2013

Publisher

Japanese:
English:

Conference name

Japanese:
English:	VLSI Design, Automation and Test (VLSI-DAT)

Conference site

Japanese:
English:	Hshinchu

Official URL