Removal of Surface Oxide Layer from Silicon Nanocrystals by HF Vapor Etching

Publication Information

Title

Japanese:
English:	Removal of Surface Oxide Layer from Silicon Nanocrystals by HF Vapor Etching

Author

Japanese:	中峯嘉文, 小寺哲夫, 内田建, 小田俊理.
English:	Y. Nakamine, T. Kodera, K. Uchida, S. Oda.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Oct. 2009

Publisher

Japanese:
English:

Conference name

Japanese:
English:	22nd Int. Microprocess and Nanotechnology Conference (MNC 2009)

Conference site

Japanese:	札幌
English:	Sapporo