ナノメータ絶縁膜を用いたLSI用新デバイスの可能性

Publication Information

Title

Japanese:	ナノメータ絶縁膜を用いたLSI用新デバイスの可能性
English:	Possibility of Novel Device for LSI Using Nanometer Insulator Film

Author

Japanese:	浅田雅洋, 坂口知明, 渡辺正裕.
English:	M. Asada, T. Sakaguchi, M. Watanabe.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

SC-6-4

Published date

Sept. 1989

Publisher

Japanese:
English:

Conference name

Japanese:	電子通信学会全国大会 (シンポジウム)
English:	Nat. Conv. Rec. of IEICE of Japan

Conference site

Japanese:	神奈川県
English:	Kanagawa