Formation of Silicon and Cobalt Silicide Nanometer Fine Particles (&lt;10nm) in CaF<sub>2</sub>

Publication Information

Title

Japanese:
English:	Formation of Silicon and Cobalt Silicide Nanometer Fine Particles (<10nm) in CaF₂

Author

Japanese:	渡辺正裕, F. Iizuka, 浅田雅洋.
English:	M. Watanabe, F. Iizuka, M. Asada.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

I22 126-127

Published date

Mar. 1995

Publisher

Japanese:
English:

Conference name

Japanese:
English:	International Workshop on Mesoscopic Physics and Electronics

Conference site

Japanese:
English:	Tokyo, Japan