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Title
Japanese: 
English:Epitaxial Growth and Electrical Conductance of Metal (CoSi2)/ Insulator (CaF2) Nanometer-Thick Layered Structure on Si(111) 
Author
Japanese: 渡辺 正裕, S. Muratake, H. Fujimoto, S. Sakamori, 浅田 雅洋, 荒井 滋久.  
English: M. Watanabe, S. Muratake, H. Fujimoto, S. Sakamori, M. Asada, S. Arai.  
Language English 
Journal/Book name
Japanese: 
English:J. Electron. Mater. 
Volume, Number, Page Vol. 21    No. 8    pp. 783-789
Published date Jan. 1992 
Publisher
Japanese: 
English: 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
DOI https://doi.org/10.1007/BF02665516

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