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Publication Information
Title
Japanese:
English:
Epitaxial Growth and Electrical Conductance of Metal (CoSi
2
)/ Insulator (CaF
2
) Nanometer-Thick Layered Structure on Si(111)
Author
Japanese:
渡辺 正裕
, S. Muratake, H. Fujimoto, S. Sakamori,
浅田 雅洋
,
荒井 滋久
.
English:
M. Watanabe
, S. Muratake, H. Fujimoto, S. Sakamori,
M. Asada
,
S. Arai
.
Language
English
Journal/Book name
Japanese:
English:
J. Electron. Mater.
Volume, Number, Page
Vol. 21 No. 8 pp. 783-789
Published date
Jan. 1992
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.1007/BF02665516
©2007
Tokyo Institute of Technology All rights reserved.