Simulation of the template release process based on fracture mechanics in nanoimprint lithography

Publication Information

Title

Japanese:
English:	Simulation of the template release process based on fracture mechanics in nanoimprint lithography

Author

Japanese:	Takahiro SHIOTSU, Kimiaki UEMURA, Takamitsu TOCHINO, Shuuya OOi, 大西有希, Masaaki YASUDA, Hiroaki KAWATA, Takuya KOBAYASHI, Yoshihiko HIRAI.
English:	Takahiro SHIOTSU, Kimiaki UEMURA, Takamitsu TOCHINO, Shuuya OOi, Yuki ONISHI, Masaaki YASUDA, Hiroaki KAWATA, Takuya KOBAYASHI, Yoshihiko HIRAI.

Language

English

Journal/Book name

Japanese:
English:	Microelectronic Engineering

Volume, Number, Page

Vol. 123 pp. 105-111

Published date

July 1, 2014

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL

DOI