SF6-Based Deep Reactive Ion Etching of (001) Rutile TiO2 Substrate for Photonic Crystal Structure with Wide Complete Photonic Band Gap

Publication Information

Title

Japanese:
English:	SF6-Based Deep Reactive Ion Etching of (001) Rutile TiO2 Substrate for Photonic Crystal Structure with Wide Complete Photonic Band Gap

Author

Japanese:	松谷晃宏, 林未来郎, 守井泰士, 西岡國生, 磯部敏宏, 中島章, 松下祥子.
English:	Akihiro Matsutani, Mikiro Hayashi, Yasushi Morii, Kunio Nishioka, Toshihiro Isobe, Akira Nakajima, Sachiko Matsushita.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Vol. 51 098002

Published date

Aug. 2012

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL