Seventy nm Pitch Patternings on CaF<sub>2</sub> by e-beam Exposure: An Inorganic Resist and a Contamination Resist

Publication Information

Title

Japanese:
English:	Seventy nm Pitch Patternings on CaF₂ by e-beam Exposure: An Inorganic Resist and a Contamination Resist

Author

Japanese:	渡辺正裕, H. Hongo, T. Hattori, 宮本恭幸, K. Furuya, T. Matsunuma, 浅田雅洋.
English:	MASAHIRO WATANABE, H. Hongo, T. Hattori, Y. Miyamoto, K. Furuya, T. Matsunuma, M. Asada.

Language

English

Journal/Book name

Japanese:
English:	Jpn. J. Appl. Phys.

Volume, Number, Page

Vol. 35 No. 12A pp. 6342-6343

Published date

Dec. 1996

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI