Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
English:
Seventy nm Pitch Patternings on CaF
2
by e-beam Exposure: An Inorganic Resist and a Contamination Resist
Author
Japanese:
渡辺正裕
, H. Hongo, T. Hattori,
宮本 恭幸
, K. Furuya, T. Matsunuma,
浅田 雅洋
.
English:
MASAHIRO WATANABE
, H. Hongo, T. Hattori,
Y. Miyamoto
, K. Furuya, T. Matsunuma,
M. Asada
.
Language
English
Journal/Book name
Japanese:
English:
Jpn. J. Appl. Phys.
Volume, Number, Page
Vol. 35 No. 12A pp. 6342-6343
Published date
Dec. 1996
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.1143/JJAP.35.6342
©2007
Tokyo Institute of Technology All rights reserved.