Metal(CoSi<sub>2</sub>)/insulator(CaF<sub>2</sub>) hot electron transistor fabricated by electron-beam lithography on a Si substrate

Publication Information

Title

Japanese:
English:	Metal(CoSi₂)/insulator(CaF₂) hot electron transistor fabricated by electron-beam lithography on a Si substrate

Author

Japanese:	渡辺正裕, W. Saitoh, T. Suemasu, Y. Kohno, 浅田雅洋.
English:	MASAHIRO WATANABE, W. Saitoh, T. Suemasu, Y. Kohno, M. Asada.

Language

English

Journal/Book name

Japanese:
English:	Jpn. J. Appl. Phys

Volume, Number, Page

Vol. 34 No. 10A pp. 1254-1256

Published date

Oct. 1995

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: