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Title
Japanese:CVD法による多孔質混合導電性基板上へのGd添加CeO2電解質薄膜合成とその特性 
English:Fabrication and characterization of Gd doped CeO2 thin-film electrolyte by CVD on porous mixed-conducting substrate 
Author
Japanese: 門馬征史1, 三田健介, 大島直也, 田中宏樹, 塩田忠, Cross Jeffrey, 櫻井修, 篠崎和夫, 脇谷尚樹.  
English: 門馬征史1, Kensuke Mita, Naoya Oshima, Hiroki Tanaka, Tadashi SHIOTA, Jeffrey Scott Cross, osamu sakurai, KAZUO SHINOZAKI, naoki wakiya.  
Language Japanese 
Journal/Book name
Japanese:日本セラミックス協会第32回エレクトロセラミックス研究討論会講演予稿集 
English: 
Volume, Number, Page     2P09    p. 49
Published date Oct. 26, 2012 
Publisher
Japanese: 
English: 
Conference name
Japanese:日本セラミックス協会第32回エレクトロセラミックス研究討論会 
English:The 32nd Electronics Division Meeting of the Ceramic Society of Japan 
Conference site
Japanese:東京 
English: 
Abstract Porous mixed-conducting electrodes, anode and cathode, with dense surfaces as substrates for Gd2O3 doped CeO2 (GDC) Chemical Vapor Deposition(CVD) were fabricated by solid state reaction and thick film process. Ni and GDC composite anode and La0.6Sr0.4CoO3-x(LSCO) cathode electrodes were made by paste processing to form planar parts and by solid state reaction with use of Polymethylmethacrylate (PMMA) spheres to form porous parts. And GDC electrolyte film was fabricated by CVD on them.

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