Epitaxial growth of germanium-rich silicon-germanium films on Si(0 0 1) substrate by reactive thermal chemical vapor deposition

Publication Information

Title

Japanese:
English:	Epitaxial growth of germanium-rich silicon-germanium films on Si(0 0 1) substrate by reactive thermal chemical vapor deposition

Author

Japanese:	陶科, 半那純一.
English:	Ke Tao, Jun-ichi Hanna.

Language

English

Journal/Book name

Japanese:
English:	Appl. Surf. Sci.

Volume, Number, Page

Vol. 282 pp. 472-477

Published date

June 13, 2013

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI