Fabrication of Si quantum dots using SF6 dry etching technique

Publication Information

Title

Japanese:
English:	Fabrication of Si quantum dots using SF6 dry etching technique

Author

Japanese:	呂逸, 小寺哲夫, 堀部浩介, 小田俊理.
English:	Yi Ro, Tetsuo. Kodera, kousuke Horibe, Shunri Oda.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

May 2014

Publisher

Japanese:
English:

Conference name

Japanese:
English:	International Conference on Quantum Dots (QD 2014)

Conference site

Japanese:
English:	Pisa