Surface assessment after removing III–V layer on III–V/silicon-on-insulator wafer fabricated by plasma activated bonding

Publication Information

Title

Japanese:
English:	Surface assessment after removing III–V layer on III–V/silicon-on-insulator wafer fabricated by plasma activated bonding

Author

Japanese:	鈴木純一, 林侑介, 久能雄輝, 姜晙炫, 雨宮智宏, 西山伸彦, 荒井滋久.
English:	Junichi Suzuki, Yuusuke Hayashi, Yuki Kuno, JoonHyun Kang, Tomohiro Amemiya, Nobuhiko Nishiyama, Shigehisa Arai.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Vol. 53 No. 11 pp. 118003

Published date

Nov. 2014

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL