Optimization of Deposition Conditions of a-Al2O3 Thin Films by Low Pressure MOCVD Using Al(CH3)3

Publication Information

Title

Japanese:
English:	Optimization of Deposition Conditions of a-Al2O3 Thin Films by Low Pressure MOCVD Using Al(CH3)3

Author

Japanese:	林俊甫, 田中敦, 石崎超矢, 西山昭雄, 脇谷尚樹, クロスジェフリースコット, 塩田忠, 櫻井修, 篠崎和夫.
English:	Lin, A. Tanaka, N. Ishizaki, A. Nishiyama, N. Wakiya, J. S. Cross, T. Shiota, O. Sakurai, K. Shinozaki.

Language

English

Journal/Book name

Japanese:
English:	Abstract book of The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)

Volume, Number, Page

26pKP27

Published date

June 25, 2014

Publisher

Japanese:
English:

Conference name

Japanese:
English:	The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)

Conference site

Japanese:
English: