Fabrication and characterization of silicon double quantum dots in n-MOS and p-MOS structures

Publication Information

Title

Japanese:
English:	Fabrication and characterization of silicon double quantum dots in n-MOS and p-MOS structures

Author

Japanese:	小寺哲夫, 山田宏, 堀部浩介, 蒲原知宏, 小田俊理.
English:	T. Kodera, K. Yamada, K. Horibe, T. Kambara, S. Oda.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

May 12, 2014

Publisher

Japanese:
English:

Conference name

Japanese:
English:	M52, International Conference on Quantum Dots (QD 2014)

Conference site

Japanese:
English:	Pisa