Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
NiOバッファ層を用いたワイドギャップ半導性
β
-Ga
2
O
3
エピタキシャル薄膜の低温PLD成長
English:
Low-temperature epitaxy of
β
-Ga
2
O
3
thin film by PLD using NiO buffer layer
Author
Japanese:
松田晃史
,
福田大二
,
塩尻大士
,
土嶺信男
,
金子智
,
吉本護
.
English:
Akifumi Matsuda
,
Daiji Fukuda
,
daishi shiojiri
,
Nobuo Tsuchimine
,
Satoru Kaneko
,
MAMORU YOSHIMOTO
.
Language
Japanese
Journal/Book name
Japanese:
日本セラミックス協会 2015年年会 講演予稿集
English:
Annual Meeting of The Ceramic Society of Japan, 2015, Abstracts
Volume, Number, Page
Published date
Mar. 6, 2015
Publisher
Japanese:
公益社団法人 日本セラミックス協会
English:
The Ceramic Society of Japan
Conference name
Japanese:
日本セラミックス協会 2015年 年会
English:
The Ceramic Society of Japan, Annual Meeting 2015
Conference site
Japanese:
岡山
English:
Okayama
Official URL
http://www.ceramic.or.jp/ig-nenkai/2015/index.html
©2007
Tokyo Institute of Technology All rights reserved.