Angled etching of (001) rutile Nb-TiO2 substrate using SF6-based capacitively coupled plasma reactive ion etching

Publication Information

Title

Japanese:
English:	Angled etching of (001) rutile Nb-TiO2 substrate using SF6-based capacitively coupled plasma reactive ion etching

Author

Japanese:	松谷晃宏, 西岡國生, 佐藤美那, 庄司大, 小林大斗, 磯部敏宏, 中島章, 立間徹, 松下祥子.
English:	Akihiro Matsutani, Kunio Nishioka, Mina Sato, Dai Shoji, Daito Kobayashi, Toshihiro Isobe, Akira Nakajima, Tetsu Tatsuma, Sachiko Matsushita.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Vol. 53 p. 06JF02

Published date

May 2014

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL