Substrate Noise Isolation Improvement by Helium-3 Irradiation Technique in a Triple-well CMOS Process

Publication Information

Title

Japanese:
English:	Substrate Noise Isolation Improvement by Helium-3 Irradiation Technique in a Triple-well CMOS Process

Author

Japanese:	李寧, Takeshi Inoue, 平野拓一, Pang Jian, ｳｰﾙｲ, 岡田健一, Hitoshi Sakane, 松澤昭.
English:	Ning Li, Takeshi Inoue, Takuichi Hirano, Jian Pang, Rui Wu, Kenichi Okada, Hitoshi Sakane, Akira Matsuzawa.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Sept. 17, 2015

Publisher

Japanese:
English:

Conference name

Japanese:
English:	IEEE European Solid-State Device Research Conference (ESSDERC)

Conference site

Japanese:
English:	Graz