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Publication Information
Title
Japanese:
English:
Substrate Noise Isolation Improvement by Helium-3 Irradiation Technique in a Triple-well CMOS Process
Author
Japanese:
李 寧
, Takeshi Inoue,
平野 拓一
,
Pang Jian
,
ウー ルイ
,
岡田 健一
, Hitoshi Sakane,
松澤 昭
.
English:
Ning Li
, Takeshi Inoue,
Takuichi Hirano
,
Jian Pang
,
Rui Wu
,
Kenichi Okada
, Hitoshi Sakane,
Akira Matsuzawa
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
Sept. 17, 2015
Publisher
Japanese:
English:
Conference name
Japanese:
English:
IEEE European Solid-State Device Research Conference (ESSDERC)
Conference site
Japanese:
English:
Graz
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Tokyo Institute of Technology All rights reserved.