Substrate Noise Isolation Improvement by Helium-3 Ion Irradiation Technique in a Triple-well CMOS Process

Publication Information

Title

Japanese:
English:	Substrate Noise Isolation Improvement by Helium-3 Ion Irradiation Technique in a Triple-well CMOS Process

Author

Japanese:	李寧, 井上剛, 平野拓一, Jian Pang, Rui Wu, 岡田健一, 坂根仁, 松澤昭.
English:	ning li, 井上剛, Takuichi Hirano, Pang Jian, Rui Wu, Kenichi Okada, 坂根仁, Akira Matsuzawa.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Vol. ICD2015-84 pp. 75-80

Published date

Dec. 18, 2015

Publisher

Japanese:
English:

Conference name

Japanese:	電子情報通信学会集積回路研究会
English:

Conference site

Japanese:	京都
English: