Influence of shield roughness on Mo/Si defect density for extreme ultraviolet lithography mask blanks

Publication Information

Title

Japanese:
English:	Influence of shield roughness on Mo/Si defect density for extreme ultraviolet lithography mask blanks

Author

Japanese:	Junichi Kageyama, 吉本護, 松田晃史, Vibhu Jindal, Patrick Kearney, Frank Goodwin.
English:	Junichi Kageyama, Mamoru Yoshimoto, Akifumi Matsuda, Vibhu Jindal, Patrick Kearney, Frank Goodwin.

Language

English

Journal/Book name

Japanese:
English:	J. Vac. Sci. Technol. B

Volume, Number, Page

Vol. 31 pp. 041603-1–5

Published date

July 13, 2013

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI