Fabrication of Ni/Al2O3/Ni Heteroepitaxial Junction by Post Hydrogen Reduction of NiO/Al2O3/NiO Tri-layered Epitaxial Thin Film

Publication Information

Title

Japanese:
English:	Fabrication of Ni/Al2O3/Ni Heteroepitaxial Junction by Post Hydrogen Reduction of NiO/Al2O3/NiO Tri-layered Epitaxial Thin Film

Author

Japanese:	Ryosuke Yamauchi, Keisuke Kobayashi, Toshimasa Suzuki, Kohji Koyama, 松田晃史, Hideki Arai, Yushi Kato, Masahiko Mitsuhashi, 金子智, 吉本護.
English:	Ryosuke Yamauchi, Keisuke Kobayashi, Toshimasa Suzuki, Kohji Koyama, Akifumi Matsuda, Hideki Arai, Yushi Kato, Masahiko Mitsuhashi, Satoru Kaneko, Mamoru Yoshimoto.

Language

English

Journal/Book name

Japanese:
English:	Jpn. J. Appl. Phys.

Volume, Number, Page

Vol. 50 pp. 098004-1-098004-2

Published date

Sept. 20, 2011

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL

DOI