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Publication Information
Title
Japanese:
固相成長法を用いた強誘電体HfO2 基薄膜のエピタキシャル成長と特性評価
English:
Author
Japanese:
三村和仙
,
片山きりは
,
清水荘雄
,
舟窪浩
,
内田寛
,
木口賢紀
, 赤間章裕,
今野豊彦
.
English:
Takanori Mimura
,
Kiriha Katayama
,
Takao Shimizu
,
HIROSHI FUNAKUBO
,
Hiroshi Uchida
,
Takanori Kiguchi
, 赤間章裕,
Toyohiko Konno
.
Language
Japanese
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
Jan. 7, 2016
Publisher
Japanese:
English:
Conference name
Japanese:
第54回セラミックス基礎科学討論会
English:
Conference site
Japanese:
佐賀市
English:
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Tokyo Institute of Technology All rights reserved.