Performance Improvement of HfS2 Transistors by Atomic Layer Deposition of HfO2

Publication Information

Title

Japanese:
English:	Performance Improvement of HfS2 Transistors by Atomic Layer Deposition of HfO2

Author

Japanese:	金澤徹, 雨宮智宏, UPADHYAYA VIKRANT, 石川篤, 鶴田健二, 田中拓男, 宮本恭幸.
English:	Toru Kanazawa, Tomohiro Amemiya, Vikrant Upadhyaya, Atsushi Ishikawa, Kenji Tsuruta, Takuo Tanaka, Yasuyuki Miyamoto.

Language

English

Journal/Book name

Japanese:
English:	IEEE Transactions on Nanotechnology

Volume, Number, Page

Vol. 16 No. 4 pp. 582-587

Published date

July 7, 2017

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI