NBIS-Stable Oxide Thin-Film Transistors Using Ultra-Wide Bandgap Amorphous Oxide Semiconductors

Publication Information

Title

Japanese:
English:	NBIS-Stable Oxide Thin-Film Transistors Using Ultra-Wide Bandgap Amorphous Oxide Semiconductors

Author

Japanese:	金正煥, 中村伸宏, 神谷利夫, 細野秀雄.
English:	Junghwan Kim, Nobuhiro Nakamura, Toshio Kamiya, Hideo Hosono.

Language

English

Journal/Book name

Japanese:
English:	SID Symposium Digest of Technical Papers

Volume, Number, Page

vol. 47 pp. 951-953

Published date

May 25, 2016

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Society for Information Display

Conference site

Japanese:
English:

Official URL

DOI