Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at Low temperatures

Publication Information

Title

Japanese:
English:	Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at Low temperatures

Author

Japanese:	Mayumi B. Takeyama, Masaru Sato, Yoshihiro Nakata, Yasushi Kobayashi, 中村友二, Atsushi Noya.
English:	Mayumi B. Takeyama, Masaru Sato, Yoshihiro Nakata, Yasushi Kobayashi, Tomoji Nakamura, Atsushi Noya.

Language

English

Journal/Book name

Japanese:
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Volume 53

Published date

Apr. 16, 2014

Publisher

Japanese:
English:	Institute of Physics

Conference name

Japanese:
English:

Conference site

Japanese:
English: