ウェットエチングを用いたβ-Ga2O3(100)基板表面のSi不純物除去

Publication Information

Title

Japanese:	ウェットエチングを用いたβ-Ga₂O₃(100)基板表面のSi不純物除去
English:	Removal of Si surface impurities from β-Ga₂O₃( substrate by using wet etching

Author

Japanese:	李政洙, 若林諒, 吉松公平, 大友明.
English:	Jung-Soo Lee, Ryo Wakabayashi, K. Yoshimatsu, A. Ohtomo.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Mar. 20, 2018

Publisher

Japanese:
English:

Conference name

Japanese:	第65回応用物理学会春季学術講演会
English:	The 65th JSAP Spring Meeting, 2017

Conference site

Japanese:	東京
English:	Tokyo

Official URL