Effect of Ar+ ion assist on the properties of a-C:H films deposited on a trench | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:
English:	Effect of Ar+ ion assist on the properties of a-C:H films deposited on a trench

Author

Japanese:	平田祐樹, Koeki Onishi, 崔埈豪.
English:	Yuki Hirata, Koeki Onishi, Junho Choi.

Language

English

Journal/Book name

Japanese:
English:	Thin Solid Films

Volume, Number, Page

Published date

June 2017

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

©2007 Tokyo Institute of Technology All rights reserved.