Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
English:
Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition
Author
Japanese:
千葉 洋一
,
平野 雅輝
,
河野 和久
, Noriaki Oshima,
舟窪 浩
.
English:
Hirokazu Chiba
,
Masaki Hirano
,
Kazuhisa Kawano
, Noriaki Oshima,
Hiroshi Funakubo
.
Language
English
Journal/Book name
Japanese:
English:
Materials Science in Semiconductor Processing
Volume, Number, Page
vol. 70 pp. 73–77
Published date
Nov. 2017
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
©2007
Tokyo Institute of Technology All rights reserved.