Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
English:
High-Mobility p-Type and n-Type Copper Nitride Semiconductors by Direct Nitriding Synthesis and In Silico Doping Design
Author
Japanese:
松崎 功佑
,
原田 航
,
熊谷 悠
, Shogo Koshiya,
上田 茂典
,
笹瀬 雅人
,
前田 明大
,
須崎(須﨑) 友文
,
北野 政明
,
大場 史康
,
細野 秀雄
.
English:
Kosuke Matsuzaki
,
Kou Harada
,
Yu Kumagai
, Shogo Koshiya,
Shigenori Ueda
,
Masato Sasase
,
Akihiro Maeda
,
Tomofumi Susaki
,
Masaaki Kitano
,
Fumiyasu Oba
,
Hideo Hosono
.
Language
English
Journal/Book name
Japanese:
English:
Adv. Mater.
Volume, Number, Page
Vol. 30 pp. 1801968
Published date
June 19, 2018
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
©2007
Tokyo Institute of Technology All rights reserved.