CF4/O2混合ガスプラズマを⽤いたCaF2単結晶およびCaF2/Siヘテロ構造の反応性イオンエッチング

Publication Information

Title

Japanese:	CF4/O2混合ガスプラズマを⽤いたCaF2単結晶およびCaF2/Siヘテロ構造の反応性イオンエッチング
English:	Reactive ion etching of CaF2/Si heterostructure using CF4/O2 plasma

Author

Japanese:	熊⾕佳郎, 渡辺正裕.
English:	Yoshiro Kumagai, MASAHIRO WATANABE.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

p. 12-436

Published date

Sept. 5, 2017

Publisher

Japanese:
English:

Conference name

Japanese:	第78回応用物理学会学術講演会
English:	The 78th Autumn Meeting of The Jpn. Soc. of Appl. Phys.

Conference site

Japanese:	福岡
English: