Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
Tuning Transition-Metal Dichalcogenide Field-Effect Transistors by Spontaneous Pattern Formation of an Ultrathin Molecular Dopant Film
English:
Tuning Transition-Metal Dichalcogenide Field-Effect Transistors by Spontaneous Pattern Formation of an Ultrathin Molecular Dopant Film
Author
Japanese:
Hisashi Ichimiya,
瀧ノ上正浩
, Akito Fukui, Kohei Miura, Takeshi Yoshimura, Atsushi Ashida, Norifumi Fujimura, Daisuke Kiriya.
English:
Hisashi Ichimiya,
Masahiro Takinoue
, Akito Fukui, Kohei Miura, Takeshi Yoshimura, Atsushi Ashida, Norifumi Fujimura, Daisuke Kiriya.
Language
English
Journal/Book name
Japanese:
ACS Nano
English:
ACS Nano
Volume, Number, Page
Vol. 12 No. 10 pp. 10123-10129
Published date
Sept. 2018
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.1021/acsnano.8b04914
©2007
Tokyo Institute of Technology All rights reserved.