Fabrication of broadband antireflection structures on glass substrates by Reactive Ion Etching for application on homogenizers in CPV systems

Publication Information

Title

Japanese:	Fabrication of broadband antireflection structures on glass substrates by Reactive Ion Etching for application on homogenizers in CPV systems
English:	Fabrication of broadband antireflection structures on glass substrates by Reactive Ion Etching for application on homogenizers in CPV systems

Author

Japanese:	Tamayo, R.E.E., Watanabe, K., Sugiyama, M., Hoshii, T., Shoji, Y., Okada, Y., Miyano, K., 星井拓也.
English:	Tamayo, R.E.E., Watanabe, K., Sugiyama, M., Hoshii, T., Shoji, Y., Okada, Y., Miyano, K., Takuya Hoshii.

Language

English

Journal/Book name

Japanese:	Conference Record of the IEEE Photovoltaic Specialists Conference
English:	Conference Record of the IEEE Photovoltaic Specialists Conference

Volume, Number, Page

pp. 489-492

Published date

2013

Publisher

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Conference name

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Conference site

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Official URL

DOI