Atomic scale analyses of As doped in Si by soft X-ray photoelectron spectroscopy and spectro-photoelectron holography

Publication Information

Title

Japanese:
English:	Atomic scale analyses of As doped in Si by soft X-ray photoelectron spectroscopy and spectro-photoelectron holography

Author

Japanese:	名取鼓太郎, 小川達博, 星井拓也, Tomohiro Matsushia, 室隆桂之, 木下豊彦, Yoshitada Morikawa, 角嶋邦之, Fumihiko Matsui, Kouichi Hayashi, 若林整, 筒井一生.
English:	Kotaro Natori, Tatsuhiro Ogawa, Takuya Hoshii, Tomohiro Matsushia, Takayuki Muro, Toyohiko Kinoshita, Yoshitada Morikawa, Kuniyuki Kakushima, Fumihiko Matsui, Kouichi Hayashi, Hitoshi Wakabayashi, Kazuo Tsutsui.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Dec. 2017

Publisher

Japanese:
English:

Conference name

Japanese:
English:	11th Int. Symp. on Atomic Level Characterization (ALC'17)

Conference site

Japanese:
English:	Kauai, HI