パルスエキシマレーザー照射によるβ-Ga<sub>2</sub>O<sub>3</sub>薄膜の室温固相エピタキシーにおける結晶化過程の評価

Publication Information

Title

Japanese:	パルスエキシマレーザー照射によるβ-Ga₂O₃薄膜の室温固相エピタキシーにおける結晶化過程の評価
English:	Investigation on solid-phase epitaxy process of β-Ga₂O₃ by pulsed excimer laser annealing at room temperature

Author

Japanese:	森田公之, 大賀友瑛, 土嶺信男, 金子智, 松田晃史, 吉本護.
English:	Hiroyuki Morita, Tomoaki Oga, Nobuo Tsuchimine, Satoru Kaneko, Akifumi Matsuda, MAMORU YOSHIMOTO.

Language

Japanese

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Feb. 25, 2019

Publisher

Japanese:
English:

Conference name

Japanese:	第66回応用物理学会春季学術講演会
English:	The 66th JSAP Spring Meeting, 2019

Conference site

Japanese:	東京
English:	Tokyo

Official URL