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Title
Japanese:Chemically tailored high-ﾏ� block copolymers for perpendicular lamellae via thermal annealing 
English:Chemically tailored high-ﾏ� block copolymers for perpendicular lamellae via thermal annealing 
Author
Japanese: Yasunari Yoshimura, Alvin Chandra, Yuta Nabae, Teruaki Hayakawa.  
English: Yasunari Yoshimura, Alvin Chandra, Yuta Nabae, Teruaki Hayakawa.  
Language English 
Journal/Book name
Japanese:Soft Matter 
English:Soft Matter 
Volume, Number, Page Vol. 15    No. 17    pp. 3497-3506
Published date Mar. 2019 
Publisher
Japanese:The Royal Society of Chemistry 
English:The Royal Society of Chemistry 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Official URL http://dx.doi.org/10.1039/C9SM00128J
 
DOI https://doi.org/10.1039/C9SM00128J
Abstract A chemically tailored high-χ block copolymer (BCP), polystyrene-block-poly[2-hydroxy-3-(2,2,2-trifluoroethylsulfanyl)propyl methacrylate] (PS-b-PHFMA), was designed to incorporate tailored surface affinities and chemical incompatibilities for engineering perpendicular lamellae using thermal annealing. PS-b-PHFMA was synthesized via the sequential anionic polymerization of styrene and glycidyl methacrylate and the post-polymerization functionalization of the glycidyl moieties with 2,2,2-trifluoroethanethiol. The bulk studies revealed lamellae with a minimum domain spacing of 9.6 nm and a large effective Flory–Huggins interaction parameter (χeff) of 0.191 at 25 °C. Furthermore, atomic force microscopy and scanning electron microscopy showed perpendicular lamellae of the PS-b-PHFMA prepared on thermally-annealed thin films. The introduction of hydrophobic trifluoroethyl moieties onto the hydrophilic glycidyl moieties successfully balanced the surface affinity of the PHFMA block relative to PS, while simultaneously increasing the strength of segregation. Thus, χeff of the chemically tailored BCP increased, and a perpendicular orientation was facilitated on the thin films using thermal annealing.

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