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Title
Japanese:埋め込みNiバックゲートを用いたp-MoS2/HfS2トンネルFET 
English: 
Author
Japanese: 張 文倫, 祢津 誠晃, 金澤 徹, 雨宮 智宏, 宮本 恭幸.  
English: Wenlun Zhang, Netsu Seikou, Toru Kanazawa, Tomohiro Amemiya, YASUYUKI MIYAMOTO.  
Language Japanese 
Journal/Book name
Japanese: 
English: 
Volume, Number, Page         19a-212B-5
Published date Sept. 19, 2018 
Publisher
Japanese: 
English: 
Conference name
Japanese:第79回応用物理学会秋季学術講演会 
English: 
Conference site
Japanese:名古屋 
English: 

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