Growth of topological insulator Bi<sub>2</sub>Te<sub>3</sub> ultrathin films on Si(111) investigated by low-energy electron microscopy

Publication Information

Title

Japanese:
English:	Growth of topological insulator Bi₂Te₃ ultrathin films on Si(111) investigated by low-energy electron microscopy

Author

Japanese:	Liu, H.W., Yuan, H.T., Fukui, N., Zhang, L., Jia, J.F., Iwasa, Y., Chen, M.W., 橋詰富博, Sakurai, T., Xue, Q.K..
English:	Liu, H.W., Yuan, H.T., Fukui, N., Zhang, L., Jia, J.F., Iwasa, Y., Chen, M.W., tomihiro hashizume, Sakurai, T., Xue, Q.K..

Language

English

Journal/Book name

Japanese:
English:	Crystal Growth and Design

Volume, Number, Page

Vol. 10 No. 10 pp. 4491-4493

Published date

2010

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI