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Title
Japanese:Dynamic Ordering in High-χ Block Copolymer Lamellae Based on Cross-Sectional Orientational Alignment 
English:Dynamic Ordering in High-χ Block Copolymer Lamellae Based on Cross-Sectional Orientational Alignment 
Author
Japanese: Ryuichi Nakatani, Alvin Chandra, Takumi Uchiyama, Yuta Nabae, Teruaki Hayakawa.  
English: Ryuichi Nakatani, Alvin Chandra, Takumi Uchiyama, Yuta Nabae, Teruaki Hayakawa.  
Language English 
Journal/Book name
Japanese:ACS Macro Letters 
English:ACS Macro Letters 
Volume, Number, Page         pp. 1122-1127
Published date June 24, 2019 
Publisher
Japanese:American Chemical Society 
English:American Chemical Society 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Official URL https://doi.org/10.1021/acsmacrolett.9b00353
 
DOI https://doi.org/10.1021/acsmacrolett.9b00353
Abstract Further development of next-generation block copolymer (BCP) lithography processes is contingent on comprehensive studies of the ordering dynamics of high-ﾏ� BCPs that can form sub-10 nm features on thin films. However, quantitative analyses of the degree of ordering on the surface and cross sections of thin films have been difficult to execute. To tackle this challenge, we employ a perpendicular lamella-forming high-ﾏ� BCP, poly(polyhedral oligomeric silsesquixone-block-2,2,2-trifluoroethyl methacrylate) (PMAPOSS-b-PTFEMA), and reveal that the high-ﾏ� PMAPOSS-b-PTFEMA requires three times the activation energy (Ea) compared to that of poly(styrene-block-methyl methacrylate) (PS-b-PMMA) for defect annihilation, at Ea = 2600 ﾂｱ 420 kJ mol窶�1, and a transition from a fast ordering regime with a growth exponent of ﾎｦ = 0.30 at lower orientational order parameters (ﾏ�2 < 0.36) to a slow ordering regime with ﾎｦ < 0.05 at ﾏ�2 > 0.36, where well-aligned lamellae restrict defect annihilations to enthalpically unfavorable glide mechanisms that require BCP intermixing.

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