Fabrication of Si Photonics Waveguides by Thick Resist-Mask Electron Beam Lithography Proximity Effect Correction

Publication Information

Title

Japanese:	Fabrication of Si Photonics Waveguides by Thick Resist-Mask Electron Beam Lithography Proximity Effect Correction
English:	Fabrication of Si Photonics Waveguides by Thick Resist-Mask Electron Beam Lithography Proximity Effect Correction

Author

Japanese:	MOATAZ Shaher Anis Mahmoud Eissa, 御手洗拓矢, 雨宮智宏, 西山伸彦, 宮本恭幸.
English:	Moataz Eissa, Takuya Mitarai, Tomohiro Amemiya, Nobuhiko Nishiyama, Yasuyuki Miyamoto.

Language

Japanese

Journal/Book name

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Volume, Number, Page

Published date

Sept. 2019

Publisher

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Conference name

Japanese:	第80回応用物理学会秋季学術講演会
English:

Conference site

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English: