Crystallization Behavior and Ferroelectric Property of HfO2-ZrO2 Films Fabricated by Chemical Solution Deposition

Publication Information

Title

Japanese:
English:	Crystallization Behavior and Ferroelectric Property of HfO2-ZrO2 Films Fabricated by Chemical Solution Deposition

Author

Japanese:	S. Nakayama, 舟窪浩, 内田寛.
English:	S. Nakayama, H. Funakubo, H. Uchida.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

May 27, 2018

Publisher

Japanese:
English:

Conference name

Japanese:
English:	IFAAP 2018 (2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference)

Conference site

Japanese:
English:	Hiroshima