Chemical fluid deposition of Hf-Zr-O-based thin films using supercritical carbon dioxide fluid

Publication Information

Title

Japanese:
English:	Chemical fluid deposition of Hf-Zr-O-based thin films using supercritical carbon dioxide fluid

Author

Japanese:	Shiokawa, M., Izaki, K., 舟窪浩, Uchida, H..
English:	Shiokawa, M., Izaki, K., HIROSHI FUNAKUBO, Uchida, H..

Language

English

Journal/Book name

Japanese:
English:	Materials Research Society Symposium Proceedings

Volume, Number, Page

Vol. 1729 pp. 99-104

Published date

2015

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI