Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
English:
Normally-Off Sputtered-MoS2 nMISFETs with MoSi2 Contact by Sulfur Powder Annealing and ALD Al2O3 Gate Dielectric for Chip Level Integration
Author
Japanese:
K. Matsuura,
濱田 昌也
,
濱田 拓也
,
谷川 晴紀
,
坂本 拓朗
, W. Cao, K. Parto, A. Hori,
宗田 伊理也
,
川那子 高暢
,
角嶋 邦之
,
筒井 一生
, A. Ogura,
BANERJEE KAUSTAV
,
若林 整
.
English:
K. Matsuura,
M. Hamada
,
T. Hamada
,
H. Tanigawa
,
T. Sakamoto
, W. Cao, K. Parto, A. Hori,
I. Muneta
,
T. Kawanago
,
K. Kakushima
,
K. Tsutsui
, A. Ogura,
K. Banerjee
,
H. Wakabayashi
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
June 2019
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Int. Workshop on Juction Technology (IWJT2019)
Conference site
Japanese:
English:
Kyoto
©2007
Tokyo Institute of Technology All rights reserved.