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Publication Information
Title
Japanese:
English:
Positive Threshold Voltage in Accumulation Capacitance of TiN-Top-Gate/High-k/Sputtered-MoS2 Stacks
Author
Japanese:
谷川 晴紀
, K. Matsuura,
宗田 伊理也
,
星井 拓也
,
角嶋 邦之
,
筒井 一生
,
若林 整
.
English:
H. Tanigawa
, K. Matsuura,
I. Muneta
,
T. Hoshii
,
K. Kakushima
,
K. Tsutsui
,
H. Wakabayashi
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
Nov. 2019
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Int. Workshop on Dielectric Thin Films for Future Electron Devices -Science and Technology- (IWDTF2019)
Conference site
Japanese:
English:
Tokyo
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Institute of Science Tokyo All rights reserved.