Positive Threshold Voltage in Accumulation Capacitance of TiN-Top-Gate/High-k/Sputtered-MoS2 Stacks

Publication Information

Title

Japanese:
English:	Positive Threshold Voltage in Accumulation Capacitance of TiN-Top-Gate/High-k/Sputtered-MoS2 Stacks

Author

Japanese:	谷川晴紀, K. Matsuura, 宗田伊理也, 星井拓也, 角嶋邦之, 筒井一生, 若林整.
English:	H. Tanigawa, K. Matsuura, I. Muneta, T. Hoshii, K. Kakushima, K. Tsutsui, H. Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Nov. 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Int. Workshop on Dielectric Thin Films for Future Electron Devices -Science and Technology- (IWDTF2019)

Conference site

Japanese:
English:	Tokyo