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Publication Information
Title
Japanese:
B4C添加HfSi2の水蒸気酸化挙動
English:
Author
Japanese:
津之浦 徹
,
吉田克己
,
矢野豊彦
,
青木卓哉
,
小笠原俊夫
.
English:
Toru Tsunoura
,
Katsumi Yoshida
,
TOYOHIKO YANO
,
Takuya Aoki
,
Toshio Ogasawara
.
Language
Japanese
Journal/Book name
Japanese:
English:
Volume, Number, Page
1D09
Published date
Sept. 5, 2018
Publisher
Japanese:
English:
Conference name
Japanese:
日本セラミックス協会第31回秋季シンポジウム
English:
Conference site
Japanese:
名古屋
English:
©2007
Tokyo Institute of Technology All rights reserved.