Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Tokyo Tech
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
Altering the Self-Assembly of Poly(styrene-
block
-methyl methacrylate) by Introduction of Strongly Dissimilar Molecules at the Block Interface
English:
Altering the Self-Assembly of Poly(styrene-
block
-methyl methacrylate) by Introduction of Strongly Dissimilar Molecules at the Block Interface
Author
Japanese:
Kevin Wylie
,
Yuta Nabae
,
Teruaki Hayakawa
.
English:
Kevin Wylie
,
Yuta Nabae
,
Teruaki Hayakawa
.
Language
English
Journal/Book name
Japanese:
Journal of Photopolymer Science and Technology
English:
Journal of Photopolymer Science and Technology
Volume, Number, Page
Vol. 32 No. 3 pp. 395-400
Published date
May 2019
Publisher
Japanese:
English:
Conference name
Japanese:
English:
Conference site
Japanese:
English:
DOI
https://doi.org/10.2494/photopolymer.32.395
©2007
Tokyo Institute of Technology All rights reserved.