A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films | Tokyo Tech Research Repository (T2R2)

Publication Information

Title

Japanese:	エピタキシャル成長したHfO2基薄膜を用いた強誘電相出現に関する研究
English:	A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films

Author

Japanese:	三村和仙.
English:	Takanori Mimura.

Type

Type:	Thesis (Ph.D.)
Country:	Japan

Language

English

Organization name

Tokyo Institute of Technology

Report number

甲第11452号

Conferred date

2020/03/26

Judge

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