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Title
Japanese:Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-ﾏ� Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing 
English:Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-ﾏ� Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing 
Author
Japanese: Ryuichi Nakatani, Hiroki Takano, Alvin Chandra, Yasunari Yoshimura, Lei Wang, Yoshinori Suzuki, Yuki Tanaka, Rina Maeda, Naoko Kihara, Shinya Minegishi, Ken Miyagi, Yuusuke Kasahara, Hironobu Sato, Yuriko Seino, Tsukasa Azuma, Hideaki Yokoyama, Christopher K. Ober, Teruaki Hayakawa.  
English: Ryuichi Nakatani, Hiroki Takano, Alvin Chandra, Yasunari Yoshimura, Lei Wang, Yoshinori Suzuki, Yuki Tanaka, Rina Maeda, Naoko Kihara, Shinya Minegishi, Ken Miyagi, Yuusuke Kasahara, Hironobu Sato, Yuriko Seino, Tsukasa Azuma, Hideaki Yokoyama, Christopher K. Ober, Teruaki Hayakawa.  
Language English 
Journal/Book name
Japanese:ACS Applied Materials & Interfaces 
English:ACS Applied Materials & Interfaces 
Volume, Number, Page Vol. 9    No. 37    pp. 31266-31278
Published date Mar. 17, 2017 
Publisher
Japanese:American Chemical Society 
English:American Chemical Society 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Official URL https://doi.org/10.1021/acsami.6b16129
 
DOI https://doi.org/10.1021/acsami.6b16129
Abstract In this study, a series of perpendicular lamellae-forming poly(polyhedral oligomeric silsesquioxane methacrylate-block-2,2,2-trifluoroethyl methacrylate)s (PMAPOSS-b-PTFEMAs) was developed based on the bottom-up concept of creating a simple yet effective material by tailoring the chemical properties and molecular composition of the material. The use of silicon (Si)-containing hybrid high-ﾏ� block copolymers (BCPs) provides easy access to sub-10 nm feature sizes. However, as the surface free energies (SFEs) of Si-containing polymers are typically vastly lower than organic polymers, this tends to result in the selective segregation of the inorganic block onto the air interface and increased difficulty in controlling the BCP orientation in thin films. Therefore, by balancing the SFEs between the organic and inorganic blocks through the use of poly(2,2,2-trifluoroethyl methacrylate) (PTFEMA) on the organic block, a polymer with an SFE similar to Si-containing polymers, orientation control of the BCP domains in thin films becomes much simpler. Herein, perpendicularly oriented BCP thin films with a ﾏ㌃ff value of 0.45 were fabricated using simple spin-coating and thermal annealing processes under ambient conditions. The thin films displayed a minimum domain size of L0 = 11 nm, as observed via atomic force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Furthermore, directed self-assembly (DSA) of the BCP on a topographically prepatterned substrate using the grapho-epitaxy method was used to successfully obtain perpendicularly oriented lamellae with a half pitch size of ca. 8 nm.

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