Si surface passivation by using triode-type plasma-enhanced chemical vapor deposition with thermally energized film-precursors

Publication Information

Title

Japanese:
English:	Si surface passivation by using triode-type plasma-enhanced chemical vapor deposition with thermally energized film-precursors

Author

Japanese:	Chisato Niikura, 白取優大, 宮島晋介.
English:	Chisato Niikura, Yuta Shiratori, Shinsuke Miyajima.

Language

English

Journal/Book name

Japanese:
English:	The European Physical Journal Applied Physics

Volume, Number, Page

Vol. 89 No. 1 pp. 10101

Published date

Mar. 27, 2020

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL

DOI