Shape PEC of Electron-beam Lithography for C-ring Metamaterial Structures

Publication Information

Title

Japanese:	C リングメタマテリアル構造のための電子ビームリソグラフィーの近接効果補正
English:	Shape PEC of Electron-beam Lithography for C-ring Metamaterial Structures

Author

Japanese:	田中真琴, 雨宮智宏, 各務響, 岡田祥, MOATAZ Shaher Anis Mahmoud Eissa, 西山伸彦.
English:	Makoto Tanaka, Tomohiro Amemiya, Hibiki Kagami, Sho Okada, Moataz Eissa, Nobuhiko Nishiyama.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Dec. 5, 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:	Photonic Device Workshop 2019

Conference site

Japanese:	東京
English: