Fabrication of Si Photonics Waveguides by Thick Resist-Mask Electron Beam Lithography Proximity Effect Correction

Publication Information

Title

Japanese:
English:	Fabrication of Si Photonics Waveguides by Thick Resist-Mask Electron Beam Lithography Proximity Effect Correction

Author

Japanese:	MOATAZ Shaher Anis Mahmoud Eissa, 御手洗拓矢, 雨宮智宏, 西山伸彦, 宮本恭幸.
English:	Moataz Eissa, Takuya Mitarai, Tomohiro Amemiya, Nobuhiko Nishiyama, Yasuyuki Miyamoto.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Oct. 2019

Publisher

Japanese:
English:

Conference name

Japanese:
English:	32nd International Microprocesses and Nanotechnology Conference (MNC 2019)

Conference site

Japanese:
English:	Tokyo